A novel UV lithographic technique for the patterning of the block copolymer (Pluronic) thin fi lms is developed. The present method is based on UVinduced water affi nity changes in block copolymer fi lms. By water vapor posttreatment of the fi lm, a difference in water content is established between UV illuminated and unilluminated sections, which can induce an osmotic pressure at the interface. This osmotic pressure drives the migration of Pluronic molecules, resulting in formation of patterns on the block copolymer fi lms. Remarkably, this patterning method requires neither initiators nor polymerizable moieties which are essential for a conventional photolithographic approach. Additionally, the etching process is bypassed, eliminating the use of destructive acids or organic solvents and making this an environmentally friendly patterning protocol. It is reported that Pluronic is photo-responsive to UV exposure, which causes the dehydration of the PEO-PPO-PEO backbone.
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|Titolo:||Micropattern Formation by Molecular Migration via UV-induced Dehydration of Block Copolymers|
|Data di pubblicazione:||2014|
|Appare nelle tipologie:||1.1 Articolo in rivista|